专注于真空薄膜领域
Ion Sputtering System  离子源溅射设备                      Ion E-beam System         离子源辅助蒸发系统
Ion Co Sputtering System   离子辅助溅镀设备           Ion Evaporator System   离子源辅助蒸发系统
Ion Etching system         离子源刻蚀设备                      Customer  Design System  支持客户自定义薄膜系统

Ion Beam Sputter Deposition
双离子源溅射系统

   
                3 cm 离子源                            5cm 离子源                                    12cm 离子源

 系统采用世界知名公司离子源




设备结构示意图：


Ion Beam Sputter Deposition
Ion Beam Sputter Deposition (IBSD)
Reactive Ion Beam Sputter Deposition (RIBSD)
Ion BeamSputterDeposition (IBSD)

©  High-End Thin Film Deposition Process
©  Lower Pressure Sputter Deposition (10-4  Torr), Sputtered Atoms Retain Kinetic Energy Due to Minimal Scatting in Low Pressure Environments
©  High Quality, Smooth, Pin Hole Free Films
©  Enhanced Adhesion and Micro-structure Control
©  Yields Excellent Coverage at Small Thicknesses and on High  Aspect Ratio Features
©  Independent Control of Ion Beam Parameters Allows User to Engineer Film for Desired Properties
©  Low energy ion assist with end-Hall ion sources
©  Typically, Film Properties from Ion Beam Deposition Exceed those Deposited by Evaporation or Magnetron Sputtering

Ion BeamSputterDeposition Applications
Device / Process                                Materials
Superconductors                                YBaCuOx, LaSrTiOx
Thin Film Heads                                 NiFe, CrCo
Optical Thin Films                              Al2O3, Ta2O5, TiO2, SiO2
Ring Laser Gyro Mirrors Multilayer    SiO2/TiO2
Dielectric Films                                   SiO2, TiO2, AlN, etc.
Encapsulation Films                           Si3N4, Al2O3
Anti-reflection Coatings                      MgF2, SiO2, Ta2O5, TiO2
Interconnect Films                              W, Au, Cu
Sensors                                              Composites or Alloys 
Advanced Magnetic Heads                 NiFe, Ta, Cu, Co, FeMn 
Semiconductor                                    Si3N4, DLC
X-ray Optics                                        W, Cu, Mo, Si, B4C, Ni, C
Laser Facets                                       Si3N4, SiO2, Al2O3, Si 
High Reflectance Mirrors                    Refractory Oxides, Si 
Divisional Wave Multiplexers              Refractory Oxides, Si
Laser coatings                                    Nb2O5, Ta2O5, HfO2, SiO2