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Ion Beam Sputter Deposition
双离子源溅射系统
  
3 cm 离子源 5cm 离子源 12cm 离子源
设备结构示意图：
Ion Beam Sputter Deposition
Ion Beam Sputter Deposition (IBSD)
Reactive Ion Beam Sputter Deposition (RIBSD)
Ion BeamSputterDeposition (IBSD)
© High-End Thin Film Deposition Process
© Lower Pressure Sputter Deposition (10-4 Torr), Sputtered Atoms Retain Kinetic Energy Due to Minimal Scatting in Low Pressure Environments
© High Quality, Smooth, Pin Hole Free Films
© Enhanced Adhesion and Micro-structure Control
© Yields Excellent Coverage at Small Thicknesses and on High Aspect Ratio Features
© Independent Control of Ion Beam Parameters Allows User to Engineer Film for Desired Properties
© Low energy ion assist with end-Hall ion sources
© Typically, Film Properties from Ion Beam Deposition Exceed those Deposited by Evaporation or Magnetron Sputtering
Ion BeamSputterDeposition Applications
Device / Process Materials
Superconductors YBaCuOx, LaSrTiOx
Thin Film Heads NiFe, CrCo
Optical Thin Films Al2O3, Ta2O5, TiO2, SiO2
Ring Laser Gyro Mirrors Multilayer SiO2/TiO2
Dielectric Films SiO2, TiO2, AlN, etc.
Encapsulation Films Si3N4, Al2O3
Anti-reflection Coatings MgF2, SiO2, Ta2O5, TiO2
Interconnect Films W, Au, Cu
Sensors Composites or Alloys
Advanced Magnetic Heads NiFe, Ta, Cu, Co, FeMn
Semiconductor Si3N4, DLC
X-ray Optics W, Cu, Mo, Si, B4C, Ni, C
Laser Facets Si3N4, SiO2, Al2O3, Si
High Reflectance Mirrors Refractory Oxides, Si
Divisional Wave Multiplexers Refractory Oxides, Si
Laser coatings Nb2O5, Ta2O5, HfO2, SiO2
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